(AGENPARL) – gio 29 agosto 2024 *Source*: Tokyo Institute of Technology
*Immediate release:* August 29, 2024
*Headline*: Breakthrough in Semiconductor Patterning: New Block Copolymer
Achieves 7.6 nm Line Width
(Tokyo, August 29) A recently developed block copolymer could help push the
limits of integration and miniaturization in semiconductor manufacturing,
report scientists in Tokyo Tech and TOK.
Chemically tailored for reliable directed self-assembly, the proposed
compound can arrange itself into perpendicular lamellar structures whose
half-pitch width is less than 10
nanometers, outperforming conventional and widely used block copolymers.
For more information, please visit the Eurekalert news that we posted at
Infographic:
https://science-tokyo.box.com/s/ta0xpsfqk6gmx5qn9l62j8z8jaa32bjn
*Contact: *Emiko Kawaguchi, Public Relations Department, Tokyo Institute
*About Tokyo Institute of Technology*
Tokyo Tech stands at the forefront of research and higher education as the
leading university for science and technology in Japan. Tokyo Tech
researchers excel in fields ranging from materials science to biology,
computer science, and physics. Founded in 1881, Tokyo Tech hosts over
10,000 undergraduate and graduate students per year, who develop into
scientific leaders and some of the most sought-after engineers in industry.
Embodying the Japanese philosophy of “monotsukuri,” meaning “technical
ingenuity and innovation,” the Tokyo Tech community strives to contribute
to society through high-impact research.
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University (TMDU) and Tokyo Institute of Technology (Tokyo Tech), with the
mission of “Advancing science and human wellbeing to create value for and
with society.”
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